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Nanoimprinting (NIL)
Nanoimprinting (NIL) is the most cost-effective process to produce large area nano-scale patterns. AccSci has more than 10 years of experience in micro and nanoimprinting technology, which can help you save time, trouble and effort in the process, reduce a lot of cost waste and optimize the efficiency and effectiveness of the whole production.
What is nanoimprinting (Nil)?
Nanoimprint lithography (NIL) is a micro and nano process for creating nanoscale patterns.It is the most common method for processing polymer structures. HavingLow cost, ,Short construction period, ,High yield, ,High resolutionThe advantages of the product include
The main mature and commonly used nanoimprinting technology processes are.Nano Thermal Imprinting (T-NIL) Technology, ,UV-NIL (Ultraviolet Light Curing Imprinting) technology, theMicroContact Printing( μCP).
Our Capabilities
Processes
Lithography (Photolithography)
Electron beam lithography (EBL)UV lithographyProximity/contact lithography, stepper lithography, etc.
Processes
Two-photon 3D printing (Two-photonpolymerization)
Processes
Etching (Etching)
Focused Ion Beam EtchingDeep reactive ion etching, inductively coupled plasma etching, ion beam sputtering etching, etc.
Processes
Nanoimprinting(Nanoimprint lithography)
Nano-thermal embossing, UV-curable embossing, micro-contact printing (soft etching)
Processes
Coating
Magnetron sputteringAtomic layer deposition.Ion beam sputtering, ,Plasma chemical vapor deposition, etc.
Processes
Electroforming (LIGA)
Nano-imprinting materials
Lithography materials
Imprinting stencil material
Silicon NIL Stamps, Fused Silica NIL Stamps, Nickel SHIM, Polymer NIL Stamps, PDMS NIL Stamps
Nano-imprinting materials
Substrate material
Sapphire, quartz, silicon (Si), nickel (Ni), polydimethylsiloxane (PDMS), gallium arsenide (GaAs), indium phosphide (InP), gallium nitride (GaN), titanium (Ti), gold (Au), polyethylene (PE) and other substrate materials
The case of nanoimprinting
Micro and nano structures
Diffractive Optical Elements (DOE)
Micro and nano structures
Superlenses (METALENSES)
Micro and nano structures
Diffraction grating (line point, shine, tilt)
Micro-Nano Architecture
Microlens arrays
Production Process
1. Preliminary offer
Send your drawings and requirements to our development manager for an initial quote
2. Program determination
We will optimize and determine the plan and quotation based on the drawings and requirements
3.Production and quality control
We will select the best equipment for your product and take full responsibility for your product to meet our standards.
4. Delivery on time
Delivered to you on time
Test characterization
Detection means
Optical microscopy (Microscopy)
Detection means
Profilometer (Profilometer)
Detection means
Sheet Resistance Measurement
Detection means
Hall measurement )
Our Advantages
Advantages
Full process coverage
Cooperate with many domestic experiments and have different processing technology reserve from 100um-5nm
Advantages
High standard quality control
We adhere to the spirit of 6sigma service, choose the most suitable experimental platform, process, personnel, materials for processing
Advantages
Quick Response
From idea to implementation, our experts will provide professional advice and ongoingTrackingServices
Advantages
Save time and worry
Turnkey service, from principle implementation, drawing design, raw material procurement, to finished product processing
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