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微纳加工 | 光刻 – 纳米压印光刻篇 纳米压印光刻 Nanoimprint Lithograph […]

Micro-Nano Processing | Lithography - Fib Focused Ion Beam Lithography This is a mask-less, resist-less scanning lithography technique. It is very similar to EBL

Micro-Nano Processing | Lithography - Electron Beam Lithography Of all the non-optical lithography methods, this is the most commonly used. It uses an electron beam instead of

Micronanofabrication | Photolithography - Optical Lithography Chapter In the context of nano- and microfabrication technologies, photolithography is used to apply a pattern to the surface of a substrate for subsequent transfer to the next

Micronanofabrication | Etching Once the resist film has been patterned by photolithography, a chemical process is used to transfer the pattern to the substrate or film below. This is called pattern transfer

Thin Film Preparation - Epitaxy Most materials exist in an amorphous, crystalline or polycrystalline state. Their mechanical, optical, thermal and electrical properties also depend on their state

Chemical methods can create films with excellent uniformity, coverage, and stoichiometry, but they require different gases, and in some cases, each film has a different gas.

Thin Film Preparation - PVD Until now, the most common physical methods were evaporation and sputtering. Both are phase methods in which the source material is transferred to the substrate one by one in situ.